| Publication details |
| Name: |
Thin film silicide formation by rapid thermal processing |
| Journal: |
Sov. J. Foreign. Electron. Techn. |
| Detail info: |
V. 291, N8, pp.27-53 (review article) - in Russian |
| Year: |
1985 |
| Authors: |
V. E. Borisenko, L. I. Ivanenko, V. A. Labunov, D. I. Zarovskii, V. V. Tokarev, V. Hitko.
|
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