| Publication details |
| Name: |
TiSi2 formation during brief heat treatment of titanium films on silicon |
| Journal: |
Sov. Phys. Tech. Phys |
| Detail info: |
31(5), 599 – 600 |
| Year: |
1986 |
| Authors: |
V. E. Borisenko, V. A. Labunov, A. Nylandsted Larsen, D. I. Zarovskii.
|
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