| Publication details |
| Name: |
Growth of epitaxial nickel disilicide during rapid thermal processing of argon-implanted nickel films on silicon |
| Journal: |
Phys. Stat. Sol. (a) |
| Detail info: |
116(1), 331 – 336 |
| Year: |
1989 |
| Authors: |
V. E. Borisenko, V. V. Tokarev, T. M. Pyatkova, A. I. Demchenko.
|
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